A Zener-Based Voltage Reference Design Compensated Using a ΔVBE Stack

Viorel Bucur, Gabriel Banarie, Stefan Marinca, M. Bodea
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Abstract

Two temperature insensitive voltage reference types are widely used today, namely buried Zener and bandgap voltage. Reference voltages based on buried Zener diodes are less sensitive to stress and have lower Long Term Drift (LTD) (approx. 3ppm/1kh), but require a minimum supply voltage of at least 6.5V. Bandgap-type voltage references can operate off supply voltages as low as 1V. However, they have larger LTD compared to buried Zener type references (typically $< \pmb{30}\mathbf{ppm}/\pmb{1}\mathbf{kh})$. Further enhancements to the architectures presented in [1] and [2] are discussed in this paper. By using a high performance monolithic deep buried Zener and replacing the embedded one, further performance enhancements in the form of lower Re-Flow drift, reduced LTD, better noise and improved linearity characteristics are obtained. Maintaining the overall circuit performance achieved in [1] and [2] of TC approx. 1.5ppm/°C, and max nonlinearity better than ~1mV over the full temperature range from − 40 to 125°C are two critical requirements.
基于齐纳的电压基准设计,使用ΔVBE堆栈进行补偿
目前广泛使用的两种温度不敏感电压基准类型,即埋地齐纳电压和带隙电压。基于埋入式齐纳二极管的参考电压对应力的敏感性较低,并且具有较低的长期漂移(LTD)(约为1)。3ppm/1kh),但要求至少6.5V的最低供电电压。带隙型电压基准可以在低至1V的电源电压下工作。然而,与隐藏的Zener类型引用(通常为$< \pmb{30}\mathbf{ppm}/\pmb{1}\mathbf{kh})相比,它们具有更大的LTD $。本文讨论了对[1]和[2]中提出的体系结构的进一步增强。通过使用高性能的单片深埋齐纳取代嵌入式齐纳,进一步提高了性能,表现为更低的再流漂移、更低的LTD、更好的噪声和改善的线性特性。保持TC近似[1]和[2]中所达到的整体电路性能。在−40至125°C的整个温度范围内,1.5ppm/°C和最大非线性优于~1mV是两个关键要求。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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