Pre-Si estimation and compensation of SRAM layout deficiencies to achieve target performance and yield

A. Bansal, Rama N. Singh, S. Mukhopadhyay, G. Han, Fook-Luen Heng, C. Chuang
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Abstract

With technology scaling, process constraints and imperfections result in significant variation of post-Si performance and stability of SRAM from designed/target pre-Si parameters. Modification/ re-optimization of SRAM cell and/or tuning of process parameters to meet target performance and stability are limited by area constraints and involve several technology ramp-up cycles. For reducing access failures, if process is not fine tuned, memory access clock cycle period may need to be increased thereby compromising performance. We propose a design methodology to meet the target performance and reduce access failures by tuning the SRAM array peripherals instead of tuning the SRAM cell and process parameters. Proposed design methodology is supported by numerical framework and validated by simulation results on 45 nm PDSOI technology. We further show that our methodology does not impact the READ stability of a cell.
预si估计和补偿SRAM布局缺陷,以达到目标性能和良率
随着技术规模的扩大,工艺限制和缺陷导致SRAM的后si性能和稳定性与设计/目标前si参数有显著差异。修改/重新优化SRAM单元和/或调整工艺参数以满足目标性能和稳定性受到面积限制,并且涉及多个技术升级周期。为了减少访问失败,如果没有对进程进行微调,可能需要增加内存访问时钟周期,从而影响性能。我们提出了一种设计方法,通过调整SRAM阵列外设而不是调整SRAM单元和工艺参数来满足目标性能并减少访问失败。提出的设计方法得到了数值框架的支持,并通过45纳米PDSOI技术的仿真结果进行了验证。我们进一步表明,我们的方法不会影响细胞的READ稳定性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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