Very high performance GaN-on-GaN diodes

I. Kizilyalli, A. Edwards, D. Bour, H. Shah, D. Disney, H. Nie
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引用次数: 3

Abstract

Vertical diodes have been fabricated on low defect density bulk GaN substrates. The devices demonstrate performance near theoretical limits for on-state resistance at a given rated breakdown voltage, based on GaN material properties. Breakdown voltage up to 3.7 kV has been measured. Measurements reveal robust avalanche breakdown, critical in an inductive circuit environment. Measurement of switching transients (5-25A) indicates the lack of minority carrier storage and low capacitances resulting in very low switching losses for the devices.
非常高性能的GaN-on-GaN二极管
垂直二极管已经在低缺陷密度的大块GaN衬底上制造出来。在给定的额定击穿电压下,基于GaN材料特性,该器件的性能接近于导态电阻的理论极限。击穿电压已测得3.7 kV。测量显示强大的雪崩击穿,在电感电路环境中至关重要。开关瞬态(5-25A)的测量表明,缺乏少数载流子存储和低电容导致器件的开关损耗非常低。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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