Synchrotron Radiation X-ray Diffraction and X-ray Photoelectron Spectroscopy Investigation on Si-based Structures for Sub-Micron Si-IC Applications

Z. Feng, L. Cheng, Chu-Wan Huang, Ying-Lang Wang, T. Yang
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引用次数: 1

Abstract

Synchrotron radiation X-ray diffraction and X-ray photoelectron spectroscopy techniques have been employed for the investigation on Si-based layer structures for sub-micron Si-IC Applications. The high energy synchrotron radiation light sources have produced plenty of X-ray lines with high index diffraction and strong X-ray photoelectron emissions. The useful information will increase our understanding of these materials which are applied extensively to the semiconductor industry.
亚微米硅集成电路中硅基结构的同步辐射x射线衍射和x射线光电子能谱研究
采用同步辐射x射线衍射和x射线光电子能谱技术研究了亚微米硅基集成电路的硅基层结构。高能同步辐射光源产生了大量高折射率衍射和强x射线光电子发射的x射线线。这些有用的信息将增加我们对这些广泛应用于半导体工业的材料的了解。
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