Indium arsenide (InAs) single and dual quantum-well heterostructure FinFETs

Arun V. Thathachary, N. Agrawal, K. Bhuwalka, M. Cantoro, Yeon-Cheol Heo, G. Lavallee, S. Maeda, S. Datta
{"title":"Indium arsenide (InAs) single and dual quantum-well heterostructure FinFETs","authors":"Arun V. Thathachary, N. Agrawal, K. Bhuwalka, M. Cantoro, Yeon-Cheol Heo, G. Lavallee, S. Maeda, S. Datta","doi":"10.1109/VLSIT.2015.7223677","DOIUrl":null,"url":null,"abstract":"This work presents experimental demonstration of InAs single and dual quantum well (DQW) heterostructure FinFETs (FF) and their superior performance over In<sub>0.7</sub>Ga<sub>0.3</sub>As QW FF. Peak mobility of 3,531 cm<sup>2</sup>/V-sec and 3,950 cm<sup>2</sup>/V-sec are obtained for InAs single QW FF and InAs DQW FF, respectively, at a fin width (W<sub>fin</sub>) of 40nm and L<sub>G</sub> = 2μm. Peak g<sub>m</sub> of 480 μS/μm, 541 μS/um; I<sub>DSAT</sub> of 121 μA/μm, 135 μA/μm; and SS<sub>SAT</sub> of 101 mV/dec,103 mV/dec is demonstrated for single and DQW FF, respectively, at L<sub>G</sub>=300nm (V<sub>D</sub> = 0.5V, I<sub>OFF</sub>=100 nA/μm). Finally, InAs DQW is shown to be a viable alternate channel for high aspect ratio n-channel FinFET.","PeriodicalId":181654,"journal":{"name":"2015 Symposium on VLSI Technology (VLSI Technology)","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2015-06-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"16","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2015 Symposium on VLSI Technology (VLSI Technology)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/VLSIT.2015.7223677","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 16

Abstract

This work presents experimental demonstration of InAs single and dual quantum well (DQW) heterostructure FinFETs (FF) and their superior performance over In0.7Ga0.3As QW FF. Peak mobility of 3,531 cm2/V-sec and 3,950 cm2/V-sec are obtained for InAs single QW FF and InAs DQW FF, respectively, at a fin width (Wfin) of 40nm and LG = 2μm. Peak gm of 480 μS/μm, 541 μS/um; IDSAT of 121 μA/μm, 135 μA/μm; and SSSAT of 101 mV/dec,103 mV/dec is demonstrated for single and DQW FF, respectively, at LG=300nm (VD = 0.5V, IOFF=100 nA/μm). Finally, InAs DQW is shown to be a viable alternate channel for high aspect ratio n-channel FinFET.
砷化铟(InAs)单双量子阱异质结构finfet
本文介绍了InAs单量子阱和双量子阱(DQW)异质结构finfet (FF)的实验证明及其优于In0.7Ga0.3As QW FF的性能。在40nm的鳍宽(Wfin)和LG = 2μm时,InAs单QW FF和InAs DQW FF的迁移率峰值分别为3531 cm2/V-sec和3950 cm2/V-sec。峰值gm为480 μS/μm, 541 μS/um;IDSAT分别为121 μA/μm、135 μA/μm;在LG=300nm (VD = 0.5V, IOFF=100 nA/μm)条件下,单波长和双波长FF的SSSAT分别为101 mV/dec和103 mV/dec。最后,InAs DQW被证明是高宽高比n通道FinFET的可行替代通道。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:604180095
Book学术官方微信