SOI lateral bipolar transistor with drive current >3mA/μm

J. Cai, T. Ning, C. D'Emic, J. Yau, K. Chan, J. Yoon, K. Jenkins, R. Muralidhar, D. Park
{"title":"SOI lateral bipolar transistor with drive current >3mA/μm","authors":"J. Cai, T. Ning, C. D'Emic, J. Yau, K. Chan, J. Yoon, K. Jenkins, R. Muralidhar, D. Park","doi":"10.1109/S3S.2013.6716518","DOIUrl":null,"url":null,"abstract":"Record-high drive current on the order of 3-5mA/μm is demonstrated in lateral silicon bipolar transistors on SOI. This is achieved by scaling quasi-neutral base width to below 10nm. The heavily doped collector enables the transistor to operate in high level injection regime without the detrimental base push-out effect. Measured cut-off frequency is the highest for a lateral bipolar and has a broad peak, confirming its immunity to base push-out. Functional complementary bipolar ring oscillator operating in the full saturation region is reported for the first time. The salient features of CMOS-compatible process and design, high current drive capability and low voltage bipolar logic present exciting opportunities for lateral SOI bipolar to complement CMOS.","PeriodicalId":219932,"journal":{"name":"2013 IEEE SOI-3D-Subthreshold Microelectronics Technology Unified Conference (S3S)","volume":"134 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2013-10-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"9","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2013 IEEE SOI-3D-Subthreshold Microelectronics Technology Unified Conference (S3S)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/S3S.2013.6716518","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 9

Abstract

Record-high drive current on the order of 3-5mA/μm is demonstrated in lateral silicon bipolar transistors on SOI. This is achieved by scaling quasi-neutral base width to below 10nm. The heavily doped collector enables the transistor to operate in high level injection regime without the detrimental base push-out effect. Measured cut-off frequency is the highest for a lateral bipolar and has a broad peak, confirming its immunity to base push-out. Functional complementary bipolar ring oscillator operating in the full saturation region is reported for the first time. The salient features of CMOS-compatible process and design, high current drive capability and low voltage bipolar logic present exciting opportunities for lateral SOI bipolar to complement CMOS.
驱动电流>3mA/μm的SOI侧双极晶体管
在SOI上的横向硅双极晶体管中实现了创纪录的3-5mA/μm的高驱动电流。这是通过将准中性基宽缩放到10nm以下来实现的。高掺杂集电极使晶体管能够在高电平注入状态下工作,而不会产生有害的基极推出效应。测量到的截止频率对于侧双极来说是最高的,并且有一个宽的峰值,证实了它对基极推出的免疫力。本文首次报道了在全饱和区域工作的功能性互补双极环振荡器。与CMOS兼容的工艺和设计、高电流驱动能力和低电压双极逻辑的显著特点为横向SOI双极补充CMOS提供了令人兴奋的机会。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信