Electromagnetic Field Measurements Above On-Wafer Calibration Standards

Abstract

This paper presents electromagnetic field measurements obtained above on-wafer calibration standards. The results show the complexity of calibrating in an on-wafer environment, especially at high frequencies as the fields couple to adjacent devices, resulting in the standards behaving different than expected. A vector network analyzer and an electro-optic measurement system are integrated to enable the measurement of the electric-field components above a calibration wafer between 2-26GHz. The measured tangential electric-field component is compared to electromagnetic simulations, verifying the validity of the measurements. Both the tangential and normal electric-field components capture the electromagnetic fields present within an on-wafer environment, when an coplanar-waveguide offset short structure is excited.