Coupling effects in high-resistivity SIMOX substrates for VHF and microwave applications

J. Raskin, D. Vanhoenacker, J. Colinge, D. Flandre
{"title":"Coupling effects in high-resistivity SIMOX substrates for VHF and microwave applications","authors":"J. Raskin, D. Vanhoenacker, J. Colinge, D. Flandre","doi":"10.1109/SOI.1995.526461","DOIUrl":null,"url":null,"abstract":"The use of high-resistivity SIMOX substrates has been proposed to enable the integration of low-loss adapted lines for MMIC applications in SOI CMOS technology. In this work we investigate the impact of the substrate resistivity on another important substrate coupling effect: the intrinsic load impedance of active transistors in amplifier configuration, which conditions the device maximum stable frequency. Related device and line modelling aspects are also discussed.","PeriodicalId":149490,"journal":{"name":"1995 IEEE International SOI Conference Proceedings","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"1995-10-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"1995 IEEE International SOI Conference Proceedings","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SOI.1995.526461","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2

Abstract

The use of high-resistivity SIMOX substrates has been proposed to enable the integration of low-loss adapted lines for MMIC applications in SOI CMOS technology. In this work we investigate the impact of the substrate resistivity on another important substrate coupling effect: the intrinsic load impedance of active transistors in amplifier configuration, which conditions the device maximum stable frequency. Related device and line modelling aspects are also discussed.
用于甚高频和微波应用的高电阻率SIMOX衬底中的耦合效应
已经提出使用高电阻率SIMOX衬底,以便在SOI CMOS技术中集成用于MMIC应用的低损耗适应线。在这项工作中,我们研究了衬底电阻率对另一个重要的衬底耦合效应的影响:放大器配置中有源晶体管的固有负载阻抗,它决定了器件的最大稳定频率。相关的设备和线路建模方面也进行了讨论。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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