Mohammmad Sajid Nazir, A. Pampori, Yawar Hayat Zarkob, Anirban Kar, Y. Chauhan
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引用次数: 0
Abstract
This paper presents a physics-based model to capture the current-voltage (I-V) and capacitance-voltage (C-V) of multiple commercially available Silicon Carbide (SiC) MOSFETs. A charge-based core model has been developed to capture the I-V characteristics of the devices. The parasitic charges and capacitances are modeled empirically to capture the C-V characteristics and kink in the gatedrain capacitance $(C_{GD})$. To study the trapping behavior, dual-pulse trap characterization is performed for multiple gate and drain quiescent conditions. A positive shift in threshold voltage $(V_{TH})$ with VGSQ is observed. Further, an RC network approach is implemented to model stress-induced changes in the I-V characteristics of the device.