Comparative analysis of electronic structure evolution in Ge1-xSnx and Ge1−xPbx alloys

C. Broderick, Edmond J. O’Halloran, E. O’Reilly
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引用次数: 3

Abstract

We present a comparative analysis of electronic structure evolution and the indirect- to direct-gap transition in Ge1−x(Sn,Pb)x group-IV semiconductor alloys. We present first principles disordered alloy electronic structure calculations for Ge1−x(Sn,Pb)x special quasi-random structures, and find a significantly larger band gap reduction in Ge1−xPbx than in Ge1−xSnx at fixed x. We calculate that Ge1−xPbx becomes a direct gap semiconductor close to the composition (x ≈ 7%) at which it also becomes a zero-gap semiconductor. The indirect-to direct-gap transition in Ge1−xSnx occurs over an extended composition range, also centered around 7%, and is driven by Sn-induced mixing of Ge Γ and L conduction states. The pronounced band mixing effects present in Ge1−xSnx alloys will have significant implications for optical and transport properties.
Ge1- xsnx和Ge1- xPbx合金电子结构演变的比较分析
本文对Ge1−x(Sn,Pb)x族iv型半导体合金的电子结构演变和间接到直接的间隙跃迁进行了比较分析。我们给出了Ge1 - x(Sn,Pb)x特殊准随机结构的无序合金电子结构的第一线原理计算,发现在固定x处,Ge1 - xPbx的带隙减小明显大于Ge1 - xSnx。我们计算出Ge1 - xPbx在接近成分(x≈7%)时成为直接隙半导体,并成为零隙半导体。Ge1−xSnx中间接到直接的间隙跃迁发生在更大的成分范围内,中心也在7%左右,是由sn诱导的Ge Γ和L导态混合驱动的。Ge1−xSnx合金中明显的能带混合效应将对其光学和输运性质产生重要影响。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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