{"title":"Application of a 2-D anisotropic etching simulator on perforated etching of quartz wafer","authors":"M. Zhao, H. Oigawa, J. Ji, T. Ueda","doi":"10.1109/ICSENS.2011.6127322","DOIUrl":null,"url":null,"abstract":"This paper describes features of a new anisotropic etching simulator and its applications on predicting perforated etching shape of quartz wafer. Specialized flow chart and relative process was designed to deal with etching after perforation. We present here two examples of its application on Z-plate and one example on AT-plate quartz crystal to show its good performance.","PeriodicalId":201386,"journal":{"name":"2011 IEEE SENSORS Proceedings","volume":"18 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2011-10-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2011 IEEE SENSORS Proceedings","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICSENS.2011.6127322","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1
Abstract
This paper describes features of a new anisotropic etching simulator and its applications on predicting perforated etching shape of quartz wafer. Specialized flow chart and relative process was designed to deal with etching after perforation. We present here two examples of its application on Z-plate and one example on AT-plate quartz crystal to show its good performance.