Structural Asymmetry related Nonlinear Mobility of Electron in InxGa1-xAs/GaAs Quantum well FET

S. R. Panda, M. Pradhan, T. Sahu, A. K. Panda
{"title":"Structural Asymmetry related Nonlinear Mobility of Electron in InxGa1-xAs/GaAs Quantum well FET","authors":"S. R. Panda, M. Pradhan, T. Sahu, A. K. Panda","doi":"10.1109/EDKCON56221.2022.10032871","DOIUrl":null,"url":null,"abstract":"Nonlinear characteristics in the mobility µ of electrons in InxGa1-xAs/GaAs pseudomorphic quantum well FET structure is studied. We vary the doping concentrations in the barriers, nd1 (substrate) and nd2 (surface), keeping the sum (nd1+nd2) unchanged. This induces an asymmetric distribution of subband wave functions within the well, thereby influencing the subband electron mobilities through intersubband effects. The resultant asymmetric variation of µ is dependent on interface roughness scattering, while the alloy disorder and impurity scatterings govern the total magnitude of µ.","PeriodicalId":296883,"journal":{"name":"2022 IEEE International Conference of Electron Devices Society Kolkata Chapter (EDKCON)","volume":"4 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2022-11-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2022 IEEE International Conference of Electron Devices Society Kolkata Chapter (EDKCON)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/EDKCON56221.2022.10032871","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

Abstract

Nonlinear characteristics in the mobility µ of electrons in InxGa1-xAs/GaAs pseudomorphic quantum well FET structure is studied. We vary the doping concentrations in the barriers, nd1 (substrate) and nd2 (surface), keeping the sum (nd1+nd2) unchanged. This induces an asymmetric distribution of subband wave functions within the well, thereby influencing the subband electron mobilities through intersubband effects. The resultant asymmetric variation of µ is dependent on interface roughness scattering, while the alloy disorder and impurity scatterings govern the total magnitude of µ.
InxGa1-xAs/GaAs量子阱场效应管中与电子非线性迁移率相关的结构不对称
研究了InxGa1-xAs/GaAs伪晶量子阱FET结构中电子迁移率μ的非线性特性。我们改变势垒nd1(底物)和nd2(表面)的掺杂浓度,保持和(nd1+nd2)不变。这导致了井内子带波函数的不对称分布,从而通过子带间效应影响子带电子迁移率。所得μ的不对称变化取决于界面粗糙度散射,而合金无序性和杂质散射控制μ的总大小。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信