{"title":"Structural Asymmetry related Nonlinear Mobility of Electron in InxGa1-xAs/GaAs Quantum well FET","authors":"S. R. Panda, M. Pradhan, T. Sahu, A. K. Panda","doi":"10.1109/EDKCON56221.2022.10032871","DOIUrl":null,"url":null,"abstract":"Nonlinear characteristics in the mobility µ of electrons in InxGa1-xAs/GaAs pseudomorphic quantum well FET structure is studied. We vary the doping concentrations in the barriers, nd1 (substrate) and nd2 (surface), keeping the sum (nd1+nd2) unchanged. This induces an asymmetric distribution of subband wave functions within the well, thereby influencing the subband electron mobilities through intersubband effects. The resultant asymmetric variation of µ is dependent on interface roughness scattering, while the alloy disorder and impurity scatterings govern the total magnitude of µ.","PeriodicalId":296883,"journal":{"name":"2022 IEEE International Conference of Electron Devices Society Kolkata Chapter (EDKCON)","volume":"4 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2022-11-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2022 IEEE International Conference of Electron Devices Society Kolkata Chapter (EDKCON)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/EDKCON56221.2022.10032871","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
Nonlinear characteristics in the mobility µ of electrons in InxGa1-xAs/GaAs pseudomorphic quantum well FET structure is studied. We vary the doping concentrations in the barriers, nd1 (substrate) and nd2 (surface), keeping the sum (nd1+nd2) unchanged. This induces an asymmetric distribution of subband wave functions within the well, thereby influencing the subband electron mobilities through intersubband effects. The resultant asymmetric variation of µ is dependent on interface roughness scattering, while the alloy disorder and impurity scatterings govern the total magnitude of µ.