Series resistance and mobility in mechanically-exfoliated layered transition metal dichalcogenide MOSFETs

A. Sachid, Hui Fang, A. Javey, C. Hu
{"title":"Series resistance and mobility in mechanically-exfoliated layered transition metal dichalcogenide MOSFETs","authors":"A. Sachid, Hui Fang, A. Javey, C. Hu","doi":"10.1109/VLSI-TSA.2014.6839668","DOIUrl":null,"url":null,"abstract":"We show that transmission line method, where a set of devices are used, does not always correctly estimate series resistance of mechanically-exfoliated transition metal dichalcogenide MOSFETs. We calculate series resistance and carrier mobility from current-voltage characteristics of a single device. We show that series resistance should be considered for accurate mobility calculation even for long channel devices.","PeriodicalId":403085,"journal":{"name":"Proceedings of Technical Program - 2014 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA)","volume":"58 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2014-04-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of Technical Program - 2014 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/VLSI-TSA.2014.6839668","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1

Abstract

We show that transmission line method, where a set of devices are used, does not always correctly estimate series resistance of mechanically-exfoliated transition metal dichalcogenide MOSFETs. We calculate series resistance and carrier mobility from current-voltage characteristics of a single device. We show that series resistance should be considered for accurate mobility calculation even for long channel devices.
机械剥离层状过渡金属二硫化物mosfet的串联电阻和迁移率
我们表明,传输线方法,其中一组器件的使用,并不总是正确地估计串联电阻的机械剥离过渡金属二硫化物mosfet。我们从单个器件的电流-电压特性计算串联电阻和载流子迁移率。我们表明,即使对于长通道器件,也应考虑串联电阻以进行精确的迁移率计算。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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