P. Wessely, Frank Wessely, Emrah Birinci, U. Schwalke, Bernadette Riedinger
{"title":"On/off-current ratios of transfer-free bilayer graphene FETs as a function of temperature","authors":"P. Wessely, Frank Wessely, Emrah Birinci, U. Schwalke, Bernadette Riedinger","doi":"10.1109/DTIS.2012.6232950","DOIUrl":null,"url":null,"abstract":"In this paper we report on a novel method to fabricate graphene transistors directly on oxidized silicon wafers without the need to transfer graphene. By means of catalytic chemical vapor deposition (CCVD) the in-situ grown bilayer graphene transistors (BiLGFETs) are realized directly on oxidized silicon substrate. These BiLGFETs possess unipolar p-type device characteristics with an extremely high on/off-current ratio between 1×106 and 1×107 at room temperature [1, 2], exceeding previously reported values by several orders of magnitude. Furthermore, when increasing the ambient temperature to 200°C, the on/off-current ratio only degrades by one order of magnitude for BiLGFETs. Besides the excellent device characteristics, the complete CCVD fabrication process is silicon CMOS compatible. This will allow a simple and low-cost integration of graphene devices for nanoelectronic applications in a hybrid silicon CMOS environment.","PeriodicalId":114829,"journal":{"name":"7th International Conference on Design & Technology of Integrated Systems in Nanoscale Era","volume":"34 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2012-05-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"7th International Conference on Design & Technology of Integrated Systems in Nanoscale Era","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/DTIS.2012.6232950","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2
Abstract
In this paper we report on a novel method to fabricate graphene transistors directly on oxidized silicon wafers without the need to transfer graphene. By means of catalytic chemical vapor deposition (CCVD) the in-situ grown bilayer graphene transistors (BiLGFETs) are realized directly on oxidized silicon substrate. These BiLGFETs possess unipolar p-type device characteristics with an extremely high on/off-current ratio between 1×106 and 1×107 at room temperature [1, 2], exceeding previously reported values by several orders of magnitude. Furthermore, when increasing the ambient temperature to 200°C, the on/off-current ratio only degrades by one order of magnitude for BiLGFETs. Besides the excellent device characteristics, the complete CCVD fabrication process is silicon CMOS compatible. This will allow a simple and low-cost integration of graphene devices for nanoelectronic applications in a hybrid silicon CMOS environment.