On/off-current ratios of transfer-free bilayer graphene FETs as a function of temperature

P. Wessely, Frank Wessely, Emrah Birinci, U. Schwalke, Bernadette Riedinger
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引用次数: 2

Abstract

In this paper we report on a novel method to fabricate graphene transistors directly on oxidized silicon wafers without the need to transfer graphene. By means of catalytic chemical vapor deposition (CCVD) the in-situ grown bilayer graphene transistors (BiLGFETs) are realized directly on oxidized silicon substrate. These BiLGFETs possess unipolar p-type device characteristics with an extremely high on/off-current ratio between 1×106 and 1×107 at room temperature [1, 2], exceeding previously reported values by several orders of magnitude. Furthermore, when increasing the ambient temperature to 200°C, the on/off-current ratio only degrades by one order of magnitude for BiLGFETs. Besides the excellent device characteristics, the complete CCVD fabrication process is silicon CMOS compatible. This will allow a simple and low-cost integration of graphene devices for nanoelectronic applications in a hybrid silicon CMOS environment.
无转移双层石墨烯fet的通/关电流比随温度的变化
本文报道了一种在氧化硅片上直接制备石墨烯晶体管而无需转移石墨烯的新方法。采用催化化学气相沉积(CCVD)技术,在氧化硅衬底上直接制备了原位生长的双层石墨烯晶体管(bilgfet)。这些bilgfet具有单极p型器件特性,在室温下具有极高的开/关电流比,在1×106和1×107之间[1,2],超过先前报道的值几个数量级。此外,当环境温度增加到200°C时,对于bilgfet而言,通/关电流比仅降低一个数量级。除了具有优异的器件特性外,完整的CCVD制造工艺与硅CMOS兼容。这将使石墨烯器件在混合硅CMOS环境中用于纳米电子应用的简单和低成本集成成为可能。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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