Low voltage SRAMs and the scalability of the 9T Supply Feedback SRAM

Janna Mezhibovsky, A. Teman, A. Fish
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引用次数: 9

Abstract

Recent research has shown that minimum energy operation of digital circuits is in the sub-threshold region, and a good trade-off between power and performance can be achieved through operation at near threshold supply voltages. However, due to process variations and device mismatch at nanoscale technology nodes, voltage scaling of standard SRAMs is limited to strong-inversion operation. One of the techniques for enabling operation at low voltages is implementation of a Supply Feedback mechanism that internally weakens the pull-up current during write operations. This concept was recently implemented in a 9T Supply Feedback SRAM (SF-SRAM) cell, fabricated and successfully tested in a 40nm CMOS technology. In this paper, we review existing low voltage SRAM solutions, overview the SF-SRAM cell, and show its scalability into deep nanoscale technologies by using the 22nm predictive model.
低电压SRAM和9T电源反馈SRAM的可扩展性
最近的研究表明,数字电路的最小能量工作在亚阈值区域,并且可以通过在接近阈值的电源电压下工作来实现功率和性能之间的良好权衡。然而,由于工艺变化和器件在纳米级技术节点上的不匹配,标准sram的电压缩放仅限于强反转操作。实现低电压操作的技术之一是在写入操作期间内部削弱上拉电流的供应反馈机制的实现。该概念最近在9T供应反馈SRAM (SF-SRAM)电池中实现,并在40nm CMOS技术上制造并成功测试。在本文中,我们回顾了现有的低压SRAM解决方案,概述了SF-SRAM单元,并通过使用22nm预测模型展示了其在深纳米技术中的可扩展性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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