Accurate RRAM transient currents during forming

P. Shrestha, D. Nminibapiel, J. Campbell, J-H Kim, C. Vaz, K. Cheung, H. Baumgart
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引用次数: 8

Abstract

The magnitude of overshoot current during forming has been shown to be a serious issue. Recently we showed that the overshoot duration is equally important in impacting device performance. Shorter duration overshoot in the range of ns yields better performance, suggesting extremely short forming pulse to be desirable. But investigation of such short forming transients is severely limited experimentally due to parasitic. In this study we demonstrate a technique to accurately de-embed these parasitic components yielding accurate forming current transients in the ps range, paving the road to careful study of the forming process.
成形过程中精确的RRAM瞬态电流
在成形过程中,超调电流的大小已被证明是一个严重的问题。最近我们展示了超调持续时间在影响设备性能方面同样重要。在ns范围内较短的持续超调产生更好的性能,这表明极短的成形脉冲是可取的。但由于寄生现象的存在,对这种短成形瞬态的研究受到了实验的严重限制。在这项研究中,我们展示了一种技术,可以准确地去除这些寄生组件,产生精确的ps范围内的成形瞬变电流,为仔细研究成形过程铺平了道路。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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