The effect of mixing development method on CD uniformity

Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference Pub Date : 1999-07-06 DOI:10.1109/IMNC.1999.797524

H. Nakamura, T. Ema, K. Hayasaki, S. Ito, K. Okumura

引用次数: 3

Abstract

It is required that the wafer size is bigger and the pattern size is finer, Bigger wafer size needs the CD uniformity in wider area and finer pattern size needs more uniform CDs. Mixing development method was found to improve CD uniformity. The effect will be reported.

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混合显影方式对CD均匀性的影响

要求晶圆尺寸更大，图案尺寸更细，晶圆尺寸更大需要更宽区域的CD均匀性，图案尺寸更细需要更均匀的CD。发现混合显影方法可以改善CD的均匀性。效果将被报告。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference

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