Silicon characterization of standby leakage reduction techniques in a 0.13μm Low Power Partially-Depleted Silicon-On-Insulator Technology

N. L'Hostis, O. Thomas, S. Haendler, A. Amara, P. Flatresse, M. Belleville
{"title":"Silicon characterization of standby leakage reduction techniques in a 0.13μm Low Power Partially-Depleted Silicon-On-Insulator Technology","authors":"N. L'Hostis, O. Thomas, S. Haendler, A. Amara, P. Flatresse, M. Belleville","doi":"10.1109/ICICDT.2006.220779","DOIUrl":null,"url":null,"abstract":"This paper presents silicon characterization results of various power gating techniques in a 0.13mum low power PD-SOI technology. A standby leakage current comparison is performed for floating body, body contacted and DTMOS transistors. It is shown that sleep transistors composed of PMOS in DTMOS configuration with an increased channel length are the best devices to reduce leakage power consumption in standby mode. Furthermore, on one hand, SOI helps reducing dynamic power consumption by more than 40% compared to bulk, and on the other hand, by implementing leakage reduction techniques, the standby leakage power is lowered by one decade","PeriodicalId":447050,"journal":{"name":"2006 IEEE International Conference on IC Design and Technology","volume":"42 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2006-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2006 IEEE International Conference on IC Design and Technology","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICICDT.2006.220779","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1

Abstract

This paper presents silicon characterization results of various power gating techniques in a 0.13mum low power PD-SOI technology. A standby leakage current comparison is performed for floating body, body contacted and DTMOS transistors. It is shown that sleep transistors composed of PMOS in DTMOS configuration with an increased channel length are the best devices to reduce leakage power consumption in standby mode. Furthermore, on one hand, SOI helps reducing dynamic power consumption by more than 40% compared to bulk, and on the other hand, by implementing leakage reduction techniques, the standby leakage power is lowered by one decade
0.13μm低功耗部分耗尽绝缘体上硅技术中待机泄漏减少技术的硅特性
本文介绍了0.13 μ m低功率PD-SOI技术中各种功率门控技术的硅表征结果。对浮体、接触体和DTMOS晶体管的待机泄漏电流进行了比较。结果表明,增加通道长度的PMOS组成的休眠晶体管是降低待机模式漏功耗的最佳器件。此外,一方面,与散装相比,SOI有助于将动态功耗降低40%以上,另一方面,通过实施泄漏减少技术,待机泄漏功率降低了十年
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:604180095
Book学术官方微信