Direct measurement of the soft-error immunity on the DRAM well structure by using the nuclear microprobe

Y. Ohno, T. Kishimoto, K. Sonoda, H. Sayama, S. Komori, A. Kinomura, Y. Horino, K. Fujii, T. Nishimura, M. Takai, H. Miyoshi
{"title":"Direct measurement of the soft-error immunity on the DRAM well structure by using the nuclear microprobe","authors":"Y. Ohno, T. Kishimoto, K. Sonoda, H. Sayama, S. Komori, A. Kinomura, Y. Horino, K. Fujii, T. Nishimura, M. Takai, H. Miyoshi","doi":"10.1109/VLSIT.1995.520899","DOIUrl":null,"url":null,"abstract":"The soft-error evaluation method using the nuclear microprobe has been demonstrated. This method realized the quantitative study of the charge collection which induces the soft-error event. The retrograde well structure with the double buried p/sup +/ layers was found to be more effective for the soft-error immunity of DRAMs, as compared with the conventional well structure on the p/sup -/epi/p/sup +/ substrate. These results were well proved by the simulation results. The evaluation method using high-energy nuclear microprobe gives the principle to optimize the well structure for the soft-error immunity of advanced DRAMs.","PeriodicalId":328379,"journal":{"name":"1995 Symposium on VLSI Technology. Digest of Technical Papers","volume":"39 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1995-06-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"1995 Symposium on VLSI Technology. Digest of Technical Papers","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/VLSIT.1995.520899","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

Abstract

The soft-error evaluation method using the nuclear microprobe has been demonstrated. This method realized the quantitative study of the charge collection which induces the soft-error event. The retrograde well structure with the double buried p/sup +/ layers was found to be more effective for the soft-error immunity of DRAMs, as compared with the conventional well structure on the p/sup -/epi/p/sup +/ substrate. These results were well proved by the simulation results. The evaluation method using high-energy nuclear microprobe gives the principle to optimize the well structure for the soft-error immunity of advanced DRAMs.
用核微探针直接测量DRAM井结构的软误差抗扰度
论证了核微探针的软误差评价方法。该方法实现了引起软误差事件的电荷收集的定量研究。与p/sup -/epi/p/sup +/基板上的常规井结构相比,双埋p/sup +/层的逆行井结构对dram的软误差免疫更有效。仿真结果很好地证明了这些结果。高能核微探针评价方法为先进dram的软误差抗扰性优化提供了理论依据。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信