Device equivalence of logic performance in 0.18 /spl mu/m and extension to 0.13 /spl mu/m embedded DRAM technology

S. Chakravarti, R. Weaver, S.S.K. Iper, T. Hook, A. Sierakowski, K. Winstel, J. Spieck, D. Prakash, X. Tian, N. Robson, H. Wang, W. Stillman, J. Rice, B. Flietner, L. Jung, S. Iyer
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Abstract

The embedded DRAM (eDRAM) technology can offer significant advantages in terms of performance and power consumption by combining a high bandwidth DRAM macro on the same chip as logic/analog circuits. However, it is a challenge for a device engineer to ensure that electrical parameters and performance of CMOS logic devices and SRAM yield are not compromised in the integration process and at the same time DRAM leakage and retention objectives are met. This paper reports a manufacturable 0.18 /spl mu/m eDRAM technology, where this task has been successfully accomplished. The characteristics of logic and array devices operating from a power supply of 1.8 V are presented. The eDRAM logic device characteristics are compared with 'logic-only' (base) process devices and are found to be comparable. DRAM device characteristics, leakage and retention data measured on test structures are also shown which satisfy the temperature range of operation from 0/spl deg/C to 105/spl deg/C of the product.
器件等效的逻辑性能在0.18 /spl mu/m和扩展到0.13 /spl mu/m嵌入式DRAM技术
嵌入式DRAM (eDRAM)技术通过将高带宽DRAM宏与逻辑/模拟电路结合在同一芯片上,可以在性能和功耗方面提供显着优势。然而,对于器件工程师来说,确保CMOS逻辑器件的电气参数和性能以及SRAM良率在集成过程中不受影响,同时满足DRAM泄漏和保留目标是一个挑战。本文报道了一种可制造的0.18 /spl mu/m的eDRAM技术,成功地完成了这一任务。介绍了在1.8 V电源下工作的逻辑和阵列器件的特性。将eDRAM逻辑器件的特性与“仅逻辑”(基础)工艺器件进行比较,发现它们具有可比性。在测试结构上测量的DRAM器件特性、泄漏和保持数据满足产品从0/spl°C到105/spl°C的工作温度范围。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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