Application of surface photovoltage method to in-line monitoring of metallic contamination in a manufacturing environment

K. Nakao, Y. Matsuda, Y. Inomaki, K. Mizukami, M. Enomoto
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Abstract

We investigated the correlation between junction degradation of bipolar transistors and heavy metal contamination using the SPV (Surface Photovoltage) method, and found Fe contamination was the main cause of collector-emitter shorts. It was revealed that the source of Fe atoms was a contaminated Si/sub 3/N/sub 4/ film by using the SPV method to analyze contamination levels of equipment. In this regard, the SPV method has proven to be a highly efficient monitoring tool for heavy metal contamination in a manufacturing environment.
表面光电压法在制造环境金属污染在线监测中的应用
利用SPV (Surface Photovoltage)方法研究了双极晶体管结退化与重金属污染之间的关系,发现铁污染是导致集电极-发射极短路的主要原因。利用SPV法分析设备的污染程度,发现Fe原子的来源是受污染的Si/sub 3/N/sub 4/薄膜。在这方面,SPV方法已被证明是制造环境中重金属污染的高效监测工具。
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