Hydrophobicity recovery of polydimethylsiloxane after repeated exposure to corona discharges. Influence of crosslink density

H. Hillborg, U. Gedde
{"title":"Hydrophobicity recovery of polydimethylsiloxane after repeated exposure to corona discharges. Influence of crosslink density","authors":"H. Hillborg, U. Gedde","doi":"10.1109/CEIDP.1999.807914","DOIUrl":null,"url":null,"abstract":"Crosslinked polydimethylsiloxane, with two different crosslink densities (M~/sub c/), have been repeatedly exposed to corona discharges. Between each exposure the specimens were allowed to rest for at least 1000 h allowing recovery of hydrophobicity. The material with the dense network (M~/sub c/: 700 g/spl middot/mol/sup -1/) was, according to XPS, more oxidized compared to the less crosslinked material (M~/sub c/: 12000 g/spl middot/mol/sup -1/). The material with the dense network gradually decreased the rate of recovery of hydrophobicity with increasing dose of corona whereas it was only moderately retarded in the less crosslinked material. Scanning electron microscopy showed the formation of surface cracks in both materials after a certain dose of corona. The material with the dense network exhibited thinner (<1 /spl mu/m), more narrow cracks, whereas the less crosslinked material exhibited wider (>5 /spl mu/m), more curved surface cracks. In the less crosslinked material, new cracks were initiated at the bottom of older cracks. Thus by further oxidation of previously unoxidized PDMS in the bottom of the cracks, new cracks were formed. It is suggested that the build-up and the fracture of the silica-like surface layer influence the transport of low molar mass siloxanes to the surface, and the rate of recovery of hydrophobicity.","PeriodicalId":267509,"journal":{"name":"1999 Annual Report Conference on Electrical Insulation and Dielectric Phenomena (Cat. No.99CH36319)","volume":"84 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1999-10-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"10","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"1999 Annual Report Conference on Electrical Insulation and Dielectric Phenomena (Cat. No.99CH36319)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/CEIDP.1999.807914","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 10

Abstract

Crosslinked polydimethylsiloxane, with two different crosslink densities (M~/sub c/), have been repeatedly exposed to corona discharges. Between each exposure the specimens were allowed to rest for at least 1000 h allowing recovery of hydrophobicity. The material with the dense network (M~/sub c/: 700 g/spl middot/mol/sup -1/) was, according to XPS, more oxidized compared to the less crosslinked material (M~/sub c/: 12000 g/spl middot/mol/sup -1/). The material with the dense network gradually decreased the rate of recovery of hydrophobicity with increasing dose of corona whereas it was only moderately retarded in the less crosslinked material. Scanning electron microscopy showed the formation of surface cracks in both materials after a certain dose of corona. The material with the dense network exhibited thinner (<1 /spl mu/m), more narrow cracks, whereas the less crosslinked material exhibited wider (>5 /spl mu/m), more curved surface cracks. In the less crosslinked material, new cracks were initiated at the bottom of older cracks. Thus by further oxidation of previously unoxidized PDMS in the bottom of the cracks, new cracks were formed. It is suggested that the build-up and the fracture of the silica-like surface layer influence the transport of low molar mass siloxanes to the surface, and the rate of recovery of hydrophobicity.
反复暴露于电晕放电后聚二甲基硅氧烷的疏水性恢复。交联密度的影响
交联聚二甲基硅氧烷具有两种不同的交联密度(M~/sub c/),反复暴露于电晕放电中。在每次暴露之间,让标本休息至少1000小时,以恢复疏水性。XPS结果表明,与交联较少的材料(M~/sub c/: 12000 g/spl middot/mol/sup -1/)相比,网络致密的材料(M~/sub c/: 700 g/spl middot/mol/sup -1/)氧化程度更高。随着电晕剂量的增加,具有密集网络的材料的疏水性恢复速率逐渐降低,而在交联较少的材料中,疏水性恢复速率仅中等延迟。扫描电镜显示,在一定剂量的电晕作用后,两种材料的表面都形成了裂纹。具有密集网络的材料表现出更薄(5 /spl mu/m)、更多弯曲表面裂纹。在交联较少的材料中,新的裂缝是在旧裂缝的底部形成的。因此,通过在裂纹底部进一步氧化先前未氧化的PDMS,形成了新的裂纹。这表明,类硅表面层的形成和断裂影响了低摩尔质量硅氧烷向表面的迁移,以及疏水性的恢复速度。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:604180095
Book学术官方微信