Investigation of Upper and Lower Limits of Carrier Concentration for Two-Dimensional Electron Gas in Strained Silicon

Jian Liu, B. Shi, K. Lai, T. Lu, Yahong Xie, D. Tsui
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Abstract

Both the simulation and experimental results confirm that there exist upper and lower limits of carrier concentration in the quantum well. The small difference between the upper and lower limits explains the narrow distribution of 2DEG density from all published experimental observations in strained Si. We report the lowest as-grown carrier density to date in Si/SiGe heterostructures
应变硅中二维电子气体载流子浓度上下限的研究
模拟和实验结果都证实了量子阱中载流子浓度存在上下限。上限和下限之间的微小差异解释了在应变Si中所有已发表的实验观测中2DEG密度分布狭窄的原因。我们报告了迄今为止在Si/SiGe异质结构中最低的生长载流子密度
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