Jian Liu, B. Shi, K. Lai, T. Lu, Yahong Xie, D. Tsui
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引用次数: 0
Abstract
Both the simulation and experimental results confirm that there exist upper and lower limits of carrier concentration in the quantum well. The small difference between the upper and lower limits explains the narrow distribution of 2DEG density from all published experimental observations in strained Si. We report the lowest as-grown carrier density to date in Si/SiGe heterostructures