A New Category of Particles at 65nm Technology and Below

The 17th Annual SEMI/IEEE ASMC 2006 Conference Pub Date : 2006-05-22 DOI:10.1109/ASMC.2006.1638787

D. Rathei, A. Neuber

引用次数: 0

Abstract

We aligned experience from yield analysis with knowledge from aerosol physics and found strong evidence that semiconductor manufacturers have face a new category of particles in the next technology nodes at and below 65nm

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65纳米及以下技术的新一类粒子

我们将产率分析的经验与气溶胶物理学的知识结合起来，发现强有力的证据表明，半导体制造商在65nm及以下的下一个技术节点上面临着一种新的颗粒类别

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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The 17th Annual SEMI/IEEE ASMC 2006 Conference

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