{"title":"Characteristics of silicon nano-scale devices","authors":"T. Hiramoto, H. Majima","doi":"10.1109/SISPAD.2000.871237","DOIUrl":null,"url":null,"abstract":"Extremely small silicon MOS devices in a 10-nm scale are successfully fabricated and characterized at room temperature and low temperatures. In such small devices, the quantum confinement effect and single electron charging effect manifest themselves in device characteristics even at room temperature. Device modeling challenges for nanoscale MOSFETs are also discussed.","PeriodicalId":132609,"journal":{"name":"2000 International Conference on Simulation Semiconductor Processes and Devices (Cat. No.00TH8502)","volume":"20 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2000-09-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2000 International Conference on Simulation Semiconductor Processes and Devices (Cat. No.00TH8502)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SISPAD.2000.871237","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1
Abstract
Extremely small silicon MOS devices in a 10-nm scale are successfully fabricated and characterized at room temperature and low temperatures. In such small devices, the quantum confinement effect and single electron charging effect manifest themselves in device characteristics even at room temperature. Device modeling challenges for nanoscale MOSFETs are also discussed.