Unified framework for facility condition monitoring, detection, and diagnostics

Huei-Shyang You, Tzu-Chi Wang, Wen-Yao Chang, Chih-Wei Lai, Ming-Wei Lee, Kei-wei Zuo
{"title":"Unified framework for facility condition monitoring, detection, and diagnostics","authors":"Huei-Shyang You, Tzu-Chi Wang, Wen-Yao Chang, Chih-Wei Lai, Ming-Wei Lee, Kei-wei Zuo","doi":"10.1109/SMTW.2004.1393712","DOIUrl":null,"url":null,"abstract":"The advanced facility monitoring and diagnosis system provide a comprehensive solution to most of the possible problems in manufacturing. This article proposes an advanced facility monitoring and diagnosis system framework - APCSuite-ECMXpert, which consists of equipment condition monitoring system (ECMS), and advanced process control toolkit - APCSuite. The methodologies applied on facility condition monitoring and the application cases for monitoring the facility equipments in semiconductor plant are illustrated in This work.","PeriodicalId":369092,"journal":{"name":"2004 Semiconductor Manufacturing Technology Workshop Proceedings (IEEE Cat. No.04EX846)","volume":"8 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2004-09-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2004 Semiconductor Manufacturing Technology Workshop Proceedings (IEEE Cat. No.04EX846)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SMTW.2004.1393712","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
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Abstract

The advanced facility monitoring and diagnosis system provide a comprehensive solution to most of the possible problems in manufacturing. This article proposes an advanced facility monitoring and diagnosis system framework - APCSuite-ECMXpert, which consists of equipment condition monitoring system (ECMS), and advanced process control toolkit - APCSuite. The methodologies applied on facility condition monitoring and the application cases for monitoring the facility equipments in semiconductor plant are illustrated in This work.
用于设施状态监测、检测和诊断的统一框架
先进的设备监测和诊断系统为生产中可能出现的大多数问题提供了全面的解决方案。本文提出了一种先进的设备监测诊断系统框架——APCSuite- ecmxpert,它由设备状态监测系统(ECMS)和先进的过程控制工具箱——APCSuite组成。介绍了设备状态监测的方法及在半导体工厂设备状态监测中的应用实例。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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