Effects on Structural and Electro-Optical Properties of Iron Incorporation to p-Zinc Oxide (ZnO) Thin Films Deposited by Dip-Coating Process

Chewki Zegadi, A. Abderrahmane, A. Djelloul, S. Hamzaoui, M. Adnane, D. Chaumont, K. Abdelkebir
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引用次数: 2

Abstract

In this paper, thin films of undoped Zinc Oxide (ZnO) and Fe-doped Zinc Oxide (ZnO: Fe) were prepared by a sol-gel process using the technique of coating .The effect of iron (Fe) incorporation on structural and electro-optical properties of ZnO films were investigated. The X-ray diffraction patterns showed that Fe-doping in Zinc Oxide thin film has affected their structural properties. All the films had polycrystalline structures, with a preferential growth along ZnO (002) plane. The crystallite size was calculated and found in the range of 25-40 (nm).The thin films were under compressive stress. The X-ray photoelectron spectroscopy results indicated that a high quality of ZnO and ZnO: Fe thin films were obtained, which are in good agreement with the results of the dislocation densities obtained from X-ray diffraction. The optical transmittance measurement revealed a high transmittance (> 85%) in the visible region and the role of Fe dopant in ZnO lattice was clearly illustrated by decreasing the optical gap and expanding the Urbach tail. The determination of type carrier conductivity affected by the incorporation of iron atoms in resistive ZnO to p-type conductivity was demonstrated by the electrical system measurement.
浸涂法制备对氧化锌薄膜结构和电光性能的影响
采用溶胶-凝胶法制备了未掺杂氧化锌(ZnO)和掺铁氧化锌(ZnO: Fe)薄膜,研究了铁(Fe)掺杂对ZnO薄膜结构和电光性能的影响。x射线衍射图表明,在氧化锌薄膜中掺杂铁对其结构性能有影响。所有薄膜均具有多晶结构,且沿ZnO(002)平面优先生长。晶体尺寸在25-40 (nm)之间。薄膜处于压应力作用下。x射线光电子能谱结果表明,制备了高质量的ZnO和ZnO: Fe薄膜,这与x射线衍射得到的位错密度结果吻合较好。光学透射率测量表明,在可见光区具有较高的透射率(> 85%),并且通过减小光学间隙和扩大Urbach尾可以清楚地说明Fe掺杂剂在ZnO晶格中的作用。通过电系统测量,证明了铁原子掺入ZnO对p型载流子电导率的影响。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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