Nano-finishing of MEMS-based platforms for optimum optical sensing

Abstract

Abstract The surface finish of the microelectromechanical systems substrate, particularly the ones that are deployed in chip-based optofluidic systems, is of utmost importance, and the overall surface finish helps in preventing light scattering and associated losses. The proposed system is made up of a microchannel with a coating on its interior which acts as a cladding layer and possesses an air-like refractive index. The water-based solutions with refractive indices higher than the coating, when confined within such channels, act as waveguides with a refractive index difference which would allow grazing incidence at the solution film interface. The microchannel is fabricated over a piece of Si along <100> direction with the help of lithography and wet etching technique. After wet chemical etching of silicon, multiple pyramidal hillocks with overall large surface roughness is observed which are not appropriate for loss-free light transmission and cause various optical losses. So the overall optimization of surface roughness created by the etching processes is critical from an optical standpoint. Roughness in the microchannel surface mainly arises due to wet etching through tetra methyl alcohol, potassium hydroxide, potassium ferricyanide and isopropyl alcohol. In this work, we have obtained surface finish upto ~1.33 nm at an etch rate of 141 nm/min which is obtained by tweaking the composition of the participating reagents in the etchants and also the etching temperature. The surface roughness obtained is quite small in comparison to the wavelength range of the visible spectrum and thus losses were greatly avoided. The low refractive index films over silicon substrate were characterized by field emission scanning electron microscopy, energy dispersive analysis of X-ray, atomic force microscopy, 3D optical profilometry and ellipsometry. The transmission results show that transmission loss was reduced by 27.42% for the coated samples with 33 nm surface roughness as compared to surface with 250 nm roughness.