{"title":"Thermal shock and thermal NF/sub 3/ in-situ furnace cleaning","authors":"B. Metteer","doi":"10.1109/ASMC.1995.484378","DOIUrl":null,"url":null,"abstract":"Initial results from SEMATECH and SEMATECH sponsored research indicate great promise for successful commercial thermal shock and thermal NF/sub 3/ in-situ cleaning of furnace process chambers. Use of the technologies on standard diffusion furnaces is highly flexible depending on a production facility's current capacity and process conditions. Research at SEMATECH aimed at optimizing both methodologies will continue into 1996 with all data being completely accessible to SEMATECH member companies.","PeriodicalId":237741,"journal":{"name":"Proceedings of SEMI Advanced Semiconductor Manufacturing Conference and Workshop","volume":"27 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1995-11-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of SEMI Advanced Semiconductor Manufacturing Conference and Workshop","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ASMC.1995.484378","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
Initial results from SEMATECH and SEMATECH sponsored research indicate great promise for successful commercial thermal shock and thermal NF/sub 3/ in-situ cleaning of furnace process chambers. Use of the technologies on standard diffusion furnaces is highly flexible depending on a production facility's current capacity and process conditions. Research at SEMATECH aimed at optimizing both methodologies will continue into 1996 with all data being completely accessible to SEMATECH member companies.