Managing induced warpage of 3D-ICs packaging using multi-layered molding materials

Chang-Chun Lee, Yu-Huan Guo, Hou-Chun Liu, Yu-Min Lin, Tao-Chih Chang
{"title":"Managing induced warpage of 3D-ICs packaging using multi-layered molding materials","authors":"Chang-Chun Lee, Yu-Huan Guo, Hou-Chun Liu, Yu-Min Lin, Tao-Chih Chang","doi":"10.1109/INEC.2016.7589277","DOIUrl":null,"url":null,"abstract":"Reduced the wafer thickness has high density arrays of through silicon via (TSV). It has significantly required in the assembly technology of three-dimensional integrated circuits (3D-ICs) packages. Find a good approach during the processes. It can decrease the damage risk for stacked chips in chip thinning processes and to enhance the micro-bumps (p-bump) mechanical reliability in this study. A chip-to-wafer (C2W) module filled with a suitable filling the gap at the bottom to a combination of stacked chips and use initialization between the molding material is considered. Compared with traditional technology and methods, significant change in the manufacturing process C2W procedure is filled into the bottom during filling, in order to achieve a pre-lead type material after the step of thinning the chip. The main advantage of the above embodiment is to reduce the thickness of the thinned mechanical load applied to the adjacent molded material, while a highly reduced thickness of the stacked chips to 30 micrometers, the back support is trying to achieve stacked silicon chips. By using the suggested method another advantage is the productivity potential because subsequent packaging process can be greatly simplified.","PeriodicalId":416565,"journal":{"name":"2016 IEEE International Nanoelectronics Conference (INEC)","volume":"22 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2016-05-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2016 IEEE International Nanoelectronics Conference (INEC)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/INEC.2016.7589277","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

Abstract

Reduced the wafer thickness has high density arrays of through silicon via (TSV). It has significantly required in the assembly technology of three-dimensional integrated circuits (3D-ICs) packages. Find a good approach during the processes. It can decrease the damage risk for stacked chips in chip thinning processes and to enhance the micro-bumps (p-bump) mechanical reliability in this study. A chip-to-wafer (C2W) module filled with a suitable filling the gap at the bottom to a combination of stacked chips and use initialization between the molding material is considered. Compared with traditional technology and methods, significant change in the manufacturing process C2W procedure is filled into the bottom during filling, in order to achieve a pre-lead type material after the step of thinning the chip. The main advantage of the above embodiment is to reduce the thickness of the thinned mechanical load applied to the adjacent molded material, while a highly reduced thickness of the stacked chips to 30 micrometers, the back support is trying to achieve stacked silicon chips. By using the suggested method another advantage is the productivity potential because subsequent packaging process can be greatly simplified.
使用多层成型材料处理3d - ic封装的诱导翘曲
减小晶圆厚度具有高密度的通硅孔阵列(TSV)。它对三维集成电路(3d - ic)封装的组装技术提出了重大要求。在这个过程中找到一个好的方法。该方法可以降低芯片薄化过程中堆叠芯片的损伤风险,提高微碰撞(p-bump)的机械可靠性。考虑了一种芯片到晶圆(C2W)模块,该模块填充了合适的底部填充间隙,以堆叠芯片和成型材料之间的使用初始化组合。与传统的工艺方法相比,C2W工艺在制造工艺上发生了显著的变化,在填充过程中填充到底部,以实现预导式材料后的减薄芯片步骤。上述实施例的主要优点是减少了施加在相邻模制材料上的薄机械载荷的厚度,同时将堆叠芯片的厚度高度降低到30微米,背面支撑正在努力实现堆叠硅芯片。通过使用建议的方法,另一个优点是生产力潜力,因为后续的包装过程可以大大简化。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信