{"title":"RF-Schottky diodes with Ni silicide for mixer applications","authors":"M. Morschbach, C. Schollhorn, M. Oehme, E. Kasper","doi":"10.1109/SMIC.2003.1196685","DOIUrl":null,"url":null,"abstract":"In this paper n- and p-doped Schottky diode with NiSi (nickel silicide) as contact material will be compared with Schottky diodes with Al (aluminum) contact. It is shown that a useable p-doped Schottky diode with high cut-off frequency could be achieved if nickel silicide is used as contact material. Also is proved that nickel silicide, if used as contact material, decreases the series resistance in cause of a reduced contact resistance.","PeriodicalId":332696,"journal":{"name":"2003 Topical Meeting on Silicon Monolithic Integrated Circuits in RF Systems, 2003. Digest of Papers.","volume":"30 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2003-04-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"10","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2003 Topical Meeting on Silicon Monolithic Integrated Circuits in RF Systems, 2003. Digest of Papers.","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SMIC.2003.1196685","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 10
Abstract
In this paper n- and p-doped Schottky diode with NiSi (nickel silicide) as contact material will be compared with Schottky diodes with Al (aluminum) contact. It is shown that a useable p-doped Schottky diode with high cut-off frequency could be achieved if nickel silicide is used as contact material. Also is proved that nickel silicide, if used as contact material, decreases the series resistance in cause of a reduced contact resistance.