{"title":"Solid polymer dye microlaser fabricated using Si mold having optically smooth surfaces","authors":"M. Sasaki, Y. Akatu, I. Li, K. Hane","doi":"10.1109/IMNC.2000.872671","DOIUrl":null,"url":null,"abstract":"In this study, a new fabrication method of the solid polymer dye microlaser is described using the Si mold having the optically smooth side walls. For preparing the optically smooth surfaces, the characteristics of the anisotropic etching is utilized. The narrow peaks which can be attributed to morphology dependent resonances of a hexagonal polymer replica of the Si mold are observed.","PeriodicalId":270640,"journal":{"name":"Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387)","volume":"17 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2000-07-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IMNC.2000.872671","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
In this study, a new fabrication method of the solid polymer dye microlaser is described using the Si mold having the optically smooth side walls. For preparing the optically smooth surfaces, the characteristics of the anisotropic etching is utilized. The narrow peaks which can be attributed to morphology dependent resonances of a hexagonal polymer replica of the Si mold are observed.