On the Possibility of Dynamically Tuning and Collapsing the Ferroelectric Hysteresis/Memory Window in an Asymmetric DG MOS Device: A Path to a Reconfigurable Logic-Memory Device

Nujhat Tasneem, A. Khan
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引用次数: 3

Abstract

We propose a novel device architecture based on ferroelectric gated double gate metal-oxide-semiconductor structure in which the memory/hysteresis window can be tuned as well as collapsed by the back-gate (control gate). The back-gate voltage alters the capacitance of the semiconductor channel which in turn modifies the capacitance matching between the semiconductor capacitance and the ferroelectric negative capacitance leading to the dynamic tunability. Such a device concept can open up pathways for a reconfigurable fabric where logic and memory operation can be tightly integrated for data intensive computing.
非对称DG MOS器件中铁电迟滞/记忆窗口动态调谐和坍缩的可能性:一条通往可重构逻辑记忆器件的路径
我们提出了一种基于铁电门控双栅金属氧化物半导体结构的新器件结构,该结构可以通过后门(控制门)调谐和收缩记忆/滞后窗口。后门电压改变半导体通道的电容,进而改变半导体电容与铁电负电容之间的电容匹配,从而导致动态可调性。这样的设备概念可以为可重构结构开辟道路,其中逻辑和内存操作可以紧密集成,用于数据密集型计算。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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