{"title":"A 48ps ECL in a self-aligned bipolar technology","authors":"K. Washio, T. Nakamura, K. Nakazato, T. Hayashida","doi":"10.1109/ISSCC.1987.1157152","DOIUrl":null,"url":null,"abstract":"A polysilicon edge base contact bipolar technology with a gate array of 48ps and a mixed ECL-I2L frequency divider operating at 10GHz will be described.","PeriodicalId":102932,"journal":{"name":"1987 IEEE International Solid-State Circuits Conference. Digest of Technical Papers","volume":"39 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"29","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"1987 IEEE International Solid-State Circuits Conference. Digest of Technical Papers","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISSCC.1987.1157152","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 29
Abstract
A polysilicon edge base contact bipolar technology with a gate array of 48ps and a mixed ECL-I2L frequency divider operating at 10GHz will be described.