Atomic force microscopy for low dimensional metal strips creation and measurements

Abstract

In the paper the lithography methods are presented. Also a lithography with use AFM systems is summarized. In the work the reconstruction of the pattern created by nanoscratching and lift-off technique is show and discussed. The resolution of created structures for certain parameters of nanoscratching was also defined. Obtained resolution of reconstructed pattern was about 120 nm what was comparable with the thickness of gold masking layer.