An Accurate Method for Determining Pattern Collapse Occurrence for Nano-Structures

H. Marumoto, M. Nakamori, H. Kawano
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引用次数: 1

Abstract

Pattern collapse of nano-structures during the wet cleaning process is one of the main problems which leads to poor device yield. In general, aspect ratio (AR) is often used as the indicator for determining the likelihood of pattern collapse occurrence, because high aspect ratio structures tend to collapse more easily. However, pattern collapse is also influenced by flexural rigidity of the structures, material, and shape. Therefore, AR lacks versatility in comparing different structures and material. We propose “$\gamma_{PC}$” as the substitute parameter for aspect ratio. In this paper, we indicate with experimental data that $\gamma_{PC}$ is more accurate than aspect ratio, and can be used to quantitatively determine the pattern collapse prevention performance of dry technologies.}
一种精确测定纳米结构模式坍塌发生的方法
湿法清洗过程中纳米结构的图案坍塌是导致器件成品率低的主要问题之一。一般来说,纵横比(AR)经常被用作确定模式崩溃可能性的指标,因为高纵横比的结构更容易崩溃。然而,图案坍塌也受结构、材料和形状的抗弯刚度的影响。因此,AR在比较不同的结构和材料方面缺乏通用性。我们建议“$\gamma_{PC}$”作为宽高比的替代参数。在本文中,我们用实验数据表明$\gamma_{PC}$比宽高比更精确,可以用来定量地确定干燥技术的防图案崩溃性能。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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