Evaluation of interfaces in narrow InAs/AlSb quantum wells

J. Tang, D.C. Larrabee, B. Brinson, G. Khodaparast, J. Kono, K. Ueda, Y. Nakajima, O. Suekane, S. Sasa, M. Inoue, K. Kolokolov, J. Li, C. Ning
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引用次数: 2

Abstract

InAs/AlSb quantum wells may be grown with two types of interfaces: InSb-like and AlAs-like. The interface type refers to the half-monolayer of the well material and half monolayer of barrier which are in contact. The type and quality of the quantum well interface is critical to the ISBT intensity and lineshape and, to a lesser extent, position. In addition to FTIR spectroscopy of the ISBT, we have performed transmission electron microscopy (TEM) to directly evaluate the quality of the interfaces at the atomic level. In order to evaluate the effects of interface type and quality on ISBT intensity, lineshape, and linewidth, we studied the TEM of a 10 nm QW sample with InSb-InSb interfaces and a 3 nm QW sample with InSb-AlAs interfaces.
窄InAs/AlSb量子阱中界面的评价
InAs/AlSb量子阱可以用两种类型的界面生长:类insb和类alas。界面类型是指接触的半单层井料和半单层阻挡层。量子阱界面的类型和质量对ISBT强度和线形至关重要,在较小程度上影响位置。除了FTIR光谱外,我们还使用透射电子显微镜(TEM)在原子水平上直接评估界面的质量。为了评估界面类型和质量对ISBT强度、线形和线宽的影响,我们研究了带有InSb-InSb界面的10 nm QW样品和带有InSb-AlAs界面的3 nm QW样品的透射电镜。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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