Zhuxin Dong, U. Wejinya, S. N. S. Chalamalasetty, M. R. Margis, T. G. Duensing
{"title":"Acid Etch Study of Vertically Aligned Carbon Nanofibers (VACNFs)","authors":"Zhuxin Dong, U. Wejinya, S. N. S. Chalamalasetty, M. R. Margis, T. G. Duensing","doi":"10.1109/NMDC.2010.5652462","DOIUrl":null,"url":null,"abstract":"One of the major limitations in the development of ultrasensitive electrochemical biosensors based on one dimensional nanostructures is the difficulty involved with uniform growth of the nanofibers. Fabrication of the Vertically Aligned Carbon Nano Fibers (VACNFs) involve treatment of several chemicals including a variety of etchants. In previous work, successful measurement and characterization of electron beam patterned VACNFs is demonstrated using Atomic Force Microscopy. Also the effect of most commonly used etchant i.e. HF is studied. Here, the effect of acid etching on VACNFs is observed and characterized using a highly sensitive and precise Atomic Force Microscopy (AFM). Furthermore, statistical analysis is performed on AFM data to demonstrate data confidence and verify experiments.","PeriodicalId":423557,"journal":{"name":"2010 IEEE Nanotechnology Materials and Devices Conference","volume":"23 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2010-12-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2010 IEEE Nanotechnology Materials and Devices Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/NMDC.2010.5652462","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
One of the major limitations in the development of ultrasensitive electrochemical biosensors based on one dimensional nanostructures is the difficulty involved with uniform growth of the nanofibers. Fabrication of the Vertically Aligned Carbon Nano Fibers (VACNFs) involve treatment of several chemicals including a variety of etchants. In previous work, successful measurement and characterization of electron beam patterned VACNFs is demonstrated using Atomic Force Microscopy. Also the effect of most commonly used etchant i.e. HF is studied. Here, the effect of acid etching on VACNFs is observed and characterized using a highly sensitive and precise Atomic Force Microscopy (AFM). Furthermore, statistical analysis is performed on AFM data to demonstrate data confidence and verify experiments.