4-inch InP crystals grown by phosphorous vapor controlled LEC method

A. Noda, K. Suzuki, A. Arakawa, H. Kurita, R. Hirano
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引用次数: 1

Abstract

4-inch Fe doped and S doped InP crystals have been grown by phosphorous vapor controlled LEC method (PC-LEC). By controlling the solid / liquid (SL) interface shape, the dislocation density of S doped InP crystals was reduced to less than 3 /spl times/ 10/sup 3/ cm/sup -2/ for the whole ingot. The dislocation density of 4 inch Fe doped InP crystals was less than 5 /spl times/ 10/sup 4/ cm/sup -2/. The total thickness variation (TTV) of 4-inch substrates was improved by optimizing the polishing conditions. The minimum TTV was about 1.6 micrometer. There was no significant difference in breakage strength between 4-inch and 3-inch Fe doped InP substrates.
磷气控LEC法生长4英寸InP晶体
采用磷气控LEC法(PC-LEC)制备了4英寸掺铁和掺S的InP晶体。通过控制固/液(SL)界面形状,使掺S InP晶体的位错密度降低到3/ spl倍/ 10/sup 3/ cm/sup -2/以下。4英寸Fe掺杂InP晶体的位错密度小于5 /spl倍/ 10/sup 4/ cm/sup -2/。通过优化抛光条件,提高了4英寸基板的总厚度变化(TTV)。最小TTV约为1.6微米。4英寸和3英寸掺铁InP衬底的断裂强度无显著差异。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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