Design and manufacturing enablement for three-dimensional (3D) integrated circuits (ICs)

Arifur Rahman, Hong Shi, Zhe Li, D. Ibbotson, S. Ramaswami
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引用次数: 8

Abstract

This paper presents an overview of design and manufacturing readiness for silicon interposer based 3D integration. We present a field programmable gate array research and development vehicle to demonstrate the capabilities of 3D technology. The characterization results show minimal performance impact due to through silicon via (TSV) to 10Gbps transceivers and potential improvement in performance by integrating metal-insulator-metal (MIM) capacitor on silicon interposer. We also provide an overview of various process steps involved in the creation and integration of TSV on silicon interposer and methods to optimize them for performance and cost. Cost reduction can be achieved by process optimization at an integrated or holistic level, better alignment of interposer specification with application requirements, and die-package co-design.
三维(3D)集成电路(ic)的设计和制造支持
本文概述了基于硅中间层的三维集成的设计和制造准备情况。我们提出了一个现场可编程门阵列研究和开发车辆,以展示3D技术的能力。表征结果表明,通过硅通孔(TSV)到10Gbps收发器对性能的影响最小,并且通过在硅中间层上集成金属-绝缘体-金属(MIM)电容器可以提高性能。我们还概述了在硅中间层上创建和集成TSV的各种工艺步骤,以及优化其性能和成本的方法。成本降低可以通过集成或整体层面的工艺优化、更好地将中间体规范与应用需求结合起来,以及模封装协同设计来实现。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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