A new model for {311} defects based on in situ measurements

Abstract

This paper introduces a new model for the {311} defect. The {311} defect is a key component of transient enhanced diffusion. This model is based on in-situ TEM annealing of defects. In-situ evidence suggests that there is no length dependence of the {311} defect evolution. Dissolution of the ensemble does, however, show a dependence on length since the defect loss rate is proportional to the number of defects. Defect nucleation is heterogeneous on clusters that result from the implant.