Zhiqin Fan, Zhanling Lu, Shi'e Yang, N. Yao, L. Cheng, Binlin Zhang
{"title":"Influence of polishing of stainless steel substrates on field emission properties of carbon nanotubes films","authors":"Zhiqin Fan, Zhanling Lu, Shi'e Yang, N. Yao, L. Cheng, Binlin Zhang","doi":"10.1109/IVESC.2004.1414216","DOIUrl":null,"url":null,"abstract":"Carbon nanotubes (CNTs) were synthesized from methane and hydrogen gas mixture directly on stainless steel plates by microwave plasma chemical vapor deposition (MPCVD). By pretreatment of the substrates such as mechanically polishing, we found the polishing can lower the turn-on field and improve the emission current density. The current density of the un-pretreated sample attains 2.9mA/cm/sup 2/, but the polished sample attains 5.5 mA/cm/sup 2/, at the electric field of 7.5 V//spl mu/m.","PeriodicalId":340787,"journal":{"name":"IVESC 2004. The 5th International Vacuum Electron Sources Conference Proceedings (IEEE Cat. No.04EX839)","volume":"36 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2004-09-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"IVESC 2004. The 5th International Vacuum Electron Sources Conference Proceedings (IEEE Cat. No.04EX839)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IVESC.2004.1414216","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
Carbon nanotubes (CNTs) were synthesized from methane and hydrogen gas mixture directly on stainless steel plates by microwave plasma chemical vapor deposition (MPCVD). By pretreatment of the substrates such as mechanically polishing, we found the polishing can lower the turn-on field and improve the emission current density. The current density of the un-pretreated sample attains 2.9mA/cm/sup 2/, but the polished sample attains 5.5 mA/cm/sup 2/, at the electric field of 7.5 V//spl mu/m.