Low loss optical coat for 157 nm lithography

Digest of Papers. Microprocesses and Nanotechnology 2001. 2001 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.01EX468) Pub Date : 2001-10-31 DOI:10.1109/IMNC.2001.984075

A. Matsumoto, A. Tanaka, J. Saito, J. Nagatsuka, T. Saito, S. Niisaka, K. Sone, M. Otani, C. Ouchi, M. Hasegawa, Y. Suzuki, R. Biro

{"title":"Low loss optical coat for 157 nm lithography","authors":"A. Matsumoto, A. Tanaka, J. Saito, J. Nagatsuka, T. Saito, S. Niisaka, K. Sone, M. Otani, C. Ouchi, M. Hasegawa, Y. Suzuki, R. Biro","doi":"10.1109/IMNC.2001.984075","DOIUrl":null,"url":null,"abstract":"The authors are aiming to develop an optical coating which has low optical loss at 157 nm; the loss should be <0.3% under our criteria. The optical loss of the optical coating consists of scattering, absorption, and reflection losses. We have provided newly developed instrumentation to measure the optical loss: a scatterometer, absorption measurement, and a VUV spectrometer. Using these measurement systems, we have investigated the transmittance (T), reflectance (R), absorptance loss, and scattering loss of five coating materials (AlF/sub 3/, Na/sub 3/AlF/sub 6/, MgF/sub 2/, LaF/sub 3/, GdF/sub 3/) and three deposition processes (resistive heat evaporation, electron beam heat evaporation, ion beam sputter). In this paper, we introduce the scatterometer, absorption measurement, and VUV spectrometer. We also discuss the measurement results of the test samples.","PeriodicalId":202620,"journal":{"name":"Digest of Papers. Microprocesses and Nanotechnology 2001. 2001 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.01EX468)","volume":"73 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2001-10-31","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Digest of Papers. Microprocesses and Nanotechnology 2001. 2001 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.01EX468)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IMNC.2001.984075","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}

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Abstract

The authors are aiming to develop an optical coating which has low optical loss at 157 nm; the loss should be <0.3% under our criteria. The optical loss of the optical coating consists of scattering, absorption, and reflection losses. We have provided newly developed instrumentation to measure the optical loss: a scatterometer, absorption measurement, and a VUV spectrometer. Using these measurement systems, we have investigated the transmittance (T), reflectance (R), absorptance loss, and scattering loss of five coating materials (AlF/sub 3/, Na/sub 3/AlF/sub 6/, MgF/sub 2/, LaF/sub 3/, GdF/sub 3/) and three deposition processes (resistive heat evaporation, electron beam heat evaporation, ion beam sputter). In this paper, we introduce the scatterometer, absorption measurement, and VUV spectrometer. We also discuss the measurement results of the test samples.

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157nm光刻用低损耗光学涂层

作者的目标是开发一种在157 nm处具有低光损耗的光学涂层;按照我们的标准，损失应该小于0.3%。光学涂层的光学损耗包括散射损耗、吸收损耗和反射损耗。我们提供了新开发的测量光学损耗的仪器:散射计、吸收测量和紫外光谱仪。利用这些测量系统，我们研究了五种涂层材料(AlF/sub 3/、Na/sub 3/AlF/sub 6/、MgF/sub 2/、LaF/sub 3/、GdF/sub 3/)的透射率(T)、反射率(R)、吸收损耗和散射损耗，以及三种沉积工艺(电阻热蒸发、电子束热蒸发、离子束溅射)。本文介绍了散射计、吸收测量和紫外光谱仪。讨论了测试样品的测量结果。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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Digest of Papers. Microprocesses and Nanotechnology 2001. 2001 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.01EX468)

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