Process variation immunity of alternative 16nm HK/MG-based FPGA logic blocks

Ahmad Alzahrani, R. Demara
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引用次数: 17

Abstract

Continued miniaturization of semiconductor technology to nanoscale dimensions has elevated reliability challenges of high density Field-Programmable Gate Arrays (FPGA) devices due to increasing impacts of Process Variation (PV). The issue is addressed herein using a systematic bottom-up analysis by determining the relative influence of PV on alternate design realizations of FPGA logic blocks. Results for conventional design structures are obtained through detailed SPICE simulations and related to structural risk features. Namely, Transmission Gate (TG) and Pass Transistor (PT) based MUX architectures for realizing Look-Up-Tables (LUTs) are compared. At threshold voltage variation σVth = 14%, PT-based designs that meet the 95% yield objective can exhibit as high delay variation as 23.3%. PV impact can be reduced to 4.9% if TG-based LUT is considered. Finally, the impact of transistor sizing is investigated as a method of mitigating PV susceptibility in FPGA structures.
可选的16nm HK/ mg FPGA逻辑块的工艺变异抗扰性
由于工艺变化(PV)的影响越来越大,半导体技术向纳米尺度的持续小型化对高密度现场可编程门阵列(FPGA)器件的可靠性提出了更高的挑战。通过确定PV对FPGA逻辑块的替代设计实现的相对影响,本文使用系统的自下而上分析来解决这个问题。常规设计结构的结果通过详细的SPICE模拟得到,并与结构风险特征相关。也就是说,传输门(TG)和通过晶体管(PT)为基础的MUX架构实现查找表(LUTs)进行了比较。当阈值电压变化σVth = 14%时,满足95%良率目标的基于pt的设计具有高达23.3%的延迟变化。如果考虑基于tg的LUT, PV影响可以减少到4.9%。最后,研究了晶体管尺寸对FPGA结构中PV敏感性的影响。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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