Breaking FAB constraint with implementing feedback process control

Proceedings of ISSM2000. Ninth International Symposium on Semiconductor Manufacturing (IEEE Cat. No.00CH37130) Pub Date : 2000-09-26 DOI:10.1109/ISSM.2000.993620

K. Takagaki, N. Matsumoto, L. Idera, T. Ishijima, Y. Ueda

引用次数: 0

Abstract

We present a feed back process control model on a PC based process control support tool which was applied to the bottleneck of overlay and expose process in optical lithography process. It was successful in breaking the bottleneck.

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通过实施反馈过程控制打破FAB约束

提出了一种基于PC机的过程控制支持工具的反馈过程控制模型，并将其应用于光学光刻过程中的覆盖和曝光瓶颈。它成功地打破了瓶颈。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Proceedings of ISSM2000. Ninth International Symposium on Semiconductor Manufacturing (IEEE Cat. No.00CH37130)

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