Photolumineseence investigation of ingot- and wafer-annealing effects on semi-insulating GaAs

O. Ka, O. Oda, Y. Makita, A. Yamada
{"title":"Photolumineseence investigation of ingot- and wafer-annealing effects on semi-insulating GaAs","authors":"O. Ka, O. Oda, Y. Makita, A. Yamada","doi":"10.1109/SIM.1992.752685","DOIUrl":null,"url":null,"abstract":"Photoluminescence spectroscopy is used to characterize semi-insulating Czochralski-grown GaAs. The spectra show the differences induced by the different post growth annealing procedures, i.e. ingot- or wafer-annealing, single- or multi-step. The wafer annealing techniques definitely lead to an improvement of the crystalline quality, while ingot annealed crystals present additional defect related-emissions. For multi-step ingot-annealed crystals, two transitions around 1.45 eV are identified with the (e,A/spl ring/) and the (D/spl ring/,A/spl ring/) recombinations of an acceptor-like defect, different from the 78-meV double acceptor. On the other hand, wafer-annealed crystals present much lower concentrations of background impurities, as estimated by selective pair luminescence.","PeriodicalId":368607,"journal":{"name":"Proceedings of the 7th Conference on Semi-insulating III-V Materials,","volume":"16 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1992-04-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of the 7th Conference on Semi-insulating III-V Materials,","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SIM.1992.752685","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

Abstract

Photoluminescence spectroscopy is used to characterize semi-insulating Czochralski-grown GaAs. The spectra show the differences induced by the different post growth annealing procedures, i.e. ingot- or wafer-annealing, single- or multi-step. The wafer annealing techniques definitely lead to an improvement of the crystalline quality, while ingot annealed crystals present additional defect related-emissions. For multi-step ingot-annealed crystals, two transitions around 1.45 eV are identified with the (e,A/spl ring/) and the (D/spl ring/,A/spl ring/) recombinations of an acceptor-like defect, different from the 78-meV double acceptor. On the other hand, wafer-annealed crystals present much lower concentrations of background impurities, as estimated by selective pair luminescence.
半绝缘GaAs的铸锭和晶片退火效应的光致发光研究
采用光致发光光谱法对半绝缘齐克拉尔斯基生长砷化镓进行了表征。光谱显示了不同的生长后退火工艺所引起的差异,即锭退火或片退火,单步退火或多步退火。晶圆退火技术确实可以改善晶体质量,而锭退火晶体则存在额外的缺陷-发射。对于多步锭退火晶体,与78-meV双受体缺陷不同的是,在1.45 eV左右的两个转变被鉴定为(e,A/spl环/)和(D/spl环/,A/spl环/)类受体缺陷的重组。另一方面,晶圆退火晶体呈现出低浓度的背景杂质,通过选择性对发光估计。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信