Analyzing resistive-open defects in SRAM core-cell under the effect of process variability

E. Vatajelu, A. Bosio, L. Dilillo, P. Girard, A. Todri, A. Virazel, N. Badereddine
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引用次数: 14

Abstract

Functional operations of a Static Random Access Memory (SRAM) are strongly affected by random variability in core-cell transistors and by the variability-induced threshold voltage mismatch between the transistors of the Input-Output (IO) circuitry (especially Sense Amplifiers). This variability also affects the faulty behavior of the SRAM array. This paper is focused on the analysis of static and dynamic faults due to resistive-open defects in the SRAM core-cell, taking into account the effects of random process variability in core-cells and IO circuitry. Statistical analyses have been performed to evaluate the SRAM failure probabilities accounting for defects at each possible location. The results show that random process variability in the SRAM core-cell and IO circuitry have an important effect on the behavior of an SRAM array and also on the defect coverage of various commonly-used test sequences. It is shown that under variability, the minimum defect size detected with maximum probability is more than 2X larger than the minimum size detected in nominal conditions, thus leaving a large range of defects undetected. Several stress conditions during test have been evaluated to assess their capability to increase the defect coverage under random process variability.
工艺变异性影响下SRAM芯单元的阻性开口缺陷分析
静态随机存取存储器(SRAM)的功能操作受到核心单元晶体管的随机可变性和输入输出(IO)电路(特别是感测放大器)晶体管之间的可变性引起的阈值电压不匹配的强烈影响。这种可变性也会影响SRAM阵列的错误行为。考虑到随机过程可变性和IO电路的影响,本文重点分析了SRAM核心单元中由于电阻性开放缺陷引起的静态和动态故障。统计分析已被用于评估SRAM在每个可能位置的缺陷失效概率。结果表明,SRAM核心单元和IO电路中的随机过程可变性对SRAM阵列的性能以及各种常用测试序列的缺陷覆盖率有重要影响。结果表明,在可变性条件下,以最大概率检测到的最小缺陷尺寸比在标称条件下检测到的最小尺寸大2倍以上,从而留下了很大范围的缺陷未被检测到。测试期间的几个应力条件已经被评估,以评估它们在随机过程可变性下增加缺陷覆盖率的能力。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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