Designing positions of grain boundaries in Si thin-film for low-energy-loss optical MEMS/NEMS devices

T. Tomikawa, J. Jeong, S. Kumagai, I. Yamashita, Y. Uraoka, M. Sasaki
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引用次数: 1

Abstract

Polycrystalline Si (poly-Si) thin-film is widely used in optical MEMS/NEMS devices. However, the device performance depends on the crystallized structure in the poly-Si thin-film. We performed metal-induced lateral crystallization (MILC) to design the positions of grain boundaries in the poly-Si thin-film. Thin-film cantilever resonators were fabricated to discuss how grain boundaries affect the oscillation characteristics. Compared with a reference resonator, a resonator in which crystallization was well-designed achieved two-fold increase in Q factor.
用于低能量损耗光学MEMS/NEMS器件的硅薄膜晶界位置设计
多晶硅薄膜广泛应用于光学MEMS/NEMS器件中。然而,器件的性能取决于多晶硅薄膜的结晶结构。我们采用金属诱导横向结晶(MILC)来设计多晶硅薄膜的晶界位置。制备了薄膜悬臂谐振腔,讨论了晶界对振荡特性的影响。与参考谐振腔相比,精心设计结晶的谐振腔的Q因子提高了2倍。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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