An application of Chebyshev spectral method in modeling the diffusion of the acid during PEB process

Pengjie Kong, Lisong Dona, Yayi Wei
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Abstract

The distribution of the acid concentration in the chemically amplified resist (CAR) plays an important role in the formation of the final resist profile. During post exposure bake (PEB) process, acid will diffuse and be neutralized in the resist to influence the acid concentration distribution and the process can be described as a reaction-diffusion system in a set of partial differential equations (PDEs). We use Chebyshev spectral method to solve those equations and it turns out to be very fast along with certain accuracy. Our simulation results indicate that Chebyshev spectral method is quite computationally efficient in dealing with PDEs during PEB process in some cases.
切比雪夫谱法在PEB过程中酸扩散模拟中的应用
化学放大抗蚀剂(CAR)中酸浓度的分布对最终抗蚀剂轮廓的形成起着重要的作用。在曝光后烘烤(PEB)过程中,酸会在抗蚀剂中扩散和中和,从而影响酸的浓度分布,这一过程可以描述为一组偏微分方程(PDEs)中的反应-扩散系统。我们用切比雪夫谱法来求解这些方程,结果表明它非常快,而且有一定的精度。仿真结果表明,在某些情况下,切比雪夫谱法在处理PEB过程中的偏微分方程时具有较高的计算效率。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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