Vertical Channel GaN Field Effect Transistor Without Junction for High Power Application

Ball Mukund Mani Tripathi, Shyama P Das
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Abstract

In this paper, we proposed a vertical channel GaN FET without junctions particularly suitable for power application. It offers less fabrication complexity and cost with enhanced device characteristics as compared to the referenced device. GaN vertical channel junction field effect transistor (VC-JFET) of equal dimension and doping concentrations is considered as the reference device. A comprehensive simulation study of parameter variation on proposed device characteristics has been performed and studied. The study envisaged the impact of lateral and vertical dimensions and doping on various device characteristics like current, ON resistance ($R_{ON}$), breakdown voltage, trans-conductance (gm), capacitance, and unity gain frequency $(f_{T})$.The obtained results and their effect on device characteristics have been thoroughly analyzed.
大功率无结垂直沟道GaN场效应晶体管
在本文中,我们提出了一种垂直沟道无结的GaN场效应管,特别适合于功率应用。与参考器件相比,它提供了更低的制造复杂性和成本,并增强了器件特性。采用等尺寸、等掺杂浓度的GaN垂直沟道结场效应晶体管(VC-JFET)作为参考器件。对所提出的器件特性的参数变化进行了全面的仿真研究。该研究设想了横向和纵向尺寸以及掺杂对各种器件特性的影响,如电流、导通电阻(R_{on}$)、击穿电压、跨导(gm)、电容和单位增益频率(f_{T})$。分析了所得结果及其对器件特性的影响。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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